• Etch and pattern transfer hard mask materials based on silicon, metal and carbon chemistries
• Speciality resist supplier – silicon and metal based resists for EUV, DUV, e-beam and NIL
• Spin-on glass dielectric
• Advanced, low k dielectrics coatings
• Optical coatings, refractive index range 1.2 – 2.0
• Optically clear, UV-curable silicone adhesives for wafer-level optics and bonding
• Process auxiliaries – strippers and removers

Patterning – Etching - Stripping Solutions

• Comprehensive package of materials and processes to create advanced optical features on various substrates:

NIL resin + underlayer(s) + stripper solution

• Extensive etch selectivity library for high aspect ratio pattern transfer
• Substrate compatible stripper solution for an easy and clean strip of the residual layers